Support for Diffusion Layers During Extraction
Some manufacturing processes define diffusion shapes that must be explicitly implanted by n-type or p-type implant shapes to get their own type. If the implant is p-type, the diffusion shape is considered to be p-type. If the implant is n-type, the diffusion shape is considered to be n-type.
Other processes derive the implant type from the definition of the diffusion layer, “ndiff” or “pdiff”, in the technology file. This is the case when an explicit implant does not exist. The connectivity extractor supports both types of diffusion layers.
The connectivity extractor does not modify the connectivity of implant shapes.
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Analog processes typically feature a single diffusion layer and two or more layers for implants. The extractor recognizes shapes on layers with function
diffas unimplanted diffusion: they need an explicit ‘n’ or ‘p’ implant shape to connect to the appropriatepwellornwell.
Thefunctionstable for such a process might include the following definitions.functions( ;( layer function [maskNumber]) ;( ----- -------- ------------) ( pwell "pwell" 10 ) ( nwell "nwell" 20 ) ( diff "diff" 30 ) ( poly "poly" 40 ) ( pimp "pplus" 50 ) ( nimp "nplus" 60 ) );functions
Onlydiffdiffusion is defined, so there are alsopimpandnimplayers defined explicitly for the implants. A shape ondiffmust overlap with a shape onpimpto connect to a shape onpwellor with a shape onnimpto connect to a shape onnwell. The connectivity stack is derived as follows:metal -> cut -> (diff & nplus) -> nwell or ntype substrate
metal -> cut -> (diff & pplus) -> pwell or ptype substrate
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Manufacturing processes used in digital design often define separate layers for n and p diffusion. A shape on these layers is considered to have an implicit implant whose type is derived from the layer function.
Here, the functions table might include the following definitions.functions( ;( layer function [maskNumber]) ;( ----- -------- ------------) ( lv_nwell "nwell" 10 ) ( hv_nwell "nwell" 20 ) ( hv_pwell "pwell" 30 ) ( ndiff "ndiff" 40 ) ( ndiff_hv "ndiff" 50 ) ( pdiff "pdiff" 60 ) ( odiff_hv "pdiff" 70 ) ( poly "poly" 80 ) );functions
There are no layers defined for implants, the extractor differentiates between p-type and n-type implants based on whether the function ispdifforndiff. Anndiffshape connects to shapes that have thenwellfunction; apdiffshape connects to shapes that have thepwellorsubstratefunction.
The connectivity stack is derived as follows:metal -> cut -> ndiff -> nwell or ntype substrate
Metal -> cut -> pdiff -> pwell or ptype substrate
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Some processes have a single active diffusion layer, such as “
ndiff”, which is used to connect to both types of wells and substrates. These processes also have a single implant, such as “pimp”, which takes priority over the diffusion type.
The functions table for such a process might include the following definitions:functions( ;( layer function [maskNumber]) ;( ----- -------- ------------) ( M1 "metal" 10 ) ( CO "cut" 20 ) ( NOD "ndiff" 30 ) ( PP "pplus" 40 ) ( NW "nwell" 50 ) ( PW "pwell" 60 ) );functions
Both, a diffusion layer,ndiff, and an implant layer,pimp, are defined. Anndiffshape connects to shapes that have thenwellfunction. Anndiffshape when overlapped by apimpshape connects to shapes that have thepwellfunction.
The connectivity stack is derived as follows:metal -> cut -> ndiff -> nwell or ntype substrate
metal -> cut -> (ndiff & pplus) -> pwell or ptype substrate
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