This topic provides a high-level overview of the new features in the IC23.1 release.
IC23.1 ISR1
Enhancements in the Generate Selected From Layout Form
You can now use the Generate Selected From Layout form to:
- Update the layout of instances in a grid to be as close to a square aspect ratio using the
button. - Switch between column-priority packing and row-priority packing for the grid of instances being placed down using the
and 
buttons. - Change orientation of the instances using the orientation buttons
,
,
, and 
.
IC23.1 Base
Enhanced Unbound Instances BackAnnotation Flow
Enhanced interactive back annotation to the schematic for unbound layout instances to keep the two views synchronized. Generate Selected from Layout Form has improved row and column placement and support for mfactored or iterated instances.
I/O Pins tab of the Generate Layout Form
Type option has been introduced to let you see information related to both electrical and optical pins at the same time. This option is available only when both electrical and photonic data is present in the schematic. Additionally, the pins table has been enhanced to allow editing and column filtering in table.
Rotate a ccCurve Counterclockwise Around the Origin
You can now use the ccOrientCurve SKILL function to return a copy of the specified ccCurve or ccPolyCurve rotated counterclockwise around the origin by a multiple of 90 degrees after optionally mirroring it across the x axis or y axis.
Automatically Adjust Waveguides to Enable Abutment
You can now automatically rotate a moving waveguide to match the rotation of the abutting interface by setting the phoAbutAutoAdjust environment variable to t.
